Low Cost, Eco-Friendly Technique for Gas-Phase Migration of Metal Oxides at Ambient Pressure

Technology #2021-104

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Fudong Liu, Ph.D.
Shaohua Xie, Ph.D.
Patent Protection

US Patent Pending

Key Points

  • An easy, effective and environmentally friendly approach for metal or metal oxide coating on certain substrates
  • Lower cost, compared to chemical vapor deposition (CVD) and atomic layer deposition (ALD) technologies


The University of Central Florida invention is a novel gas-induced metal migration and deposition (GIMMD) technique at ambient pressure. The invention can provide an effective and environmentally benign approach for metal or metal-oxide coating on specific substrates, as well as the synthesis of new generation, cost-effective catalytic materials for chemical, energy and environmental applications. Chemical vapor deposition (CVD) and atomic layer deposition (ALD) techniques have been used in coating, material synthesis, and catalysis industries. They can require either high energy input or expensive precursors and pose risks of environmental pollution due to highly volatile organic compounds. This GIMMD technique invention could revolutionize these industries and benefit the eco-environment based on its intrinsic characteristics of facile operation, high efficiency, low cost, high versatility, environmental friendliness, and broad applications.


  • Environmentally friendly, high-efficiency operation with broad applications
  • Effectively produces new catalytic materials with much higher catalytic activity and stability compared to conventional methods
  • Can be easily integrated into an existing product line such as environmental catalyst manufacturing or bactericidal/virucidal surface coating

Market Application

  • Catalysis
  • Raw material supplies